High density plasma sources : design, physics, and performance
Oleg A Popov
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
카테고리:
년:
1995
출판사:
Noyes Publications
언어:
english
페이지:
466
ISBN 10:
1591240638
ISBN 13:
9781591240631
시리즈:
Materials science and process technology series., Electronic materials and process technology
파일:
PDF, 15.63 MB
IPFS:
,
english, 1995